The Series AR710 HFADD is designed for trace gas analysis of impurities in argon.
Applications: specialty gas manufacturers, industrial processes requiring inert argon, the electronics industry, gas separation plants, air separation plants, nuclear industry, certification of argon purity, semiconductor industry
Analysis of trace H2, O2, N2, CH4, CO and CO2 in high purity argon (ppb)
Sensitivity — H2: < 15 ppb; O2: < 75 ppb; N2: < 100 ppb; CH4: < 30 ppb;
CO: < 200 ppb; CO2: <100 ppb
Analytical cycle: all components < 10 minutes
High analytical precision: ± 1% full scale
High stability and reproducibility
Output: 0-100 mV; 4-20 mA (optional)
Options: automatic or manual operation modes, auto-zero
On-line monitoring by linking workstation
Installation: bench or 19” rack
Power: 110-220 V, 50-60 Hz